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испаравање

The common method used to deposit thin-film materials; material to be deposited is heated in a vacuum (10-6, 10-7 Torr range) until it melts and starts evaporating; this vapor condenses on a cooler substrate inside the evaporation chamber forming very smooth and uniform thin films; not suitable for high melting point materials; PVD method of thin film formation.

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Ordklass: noun
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Blossary:
Bransch/domän: Semiconductors
Category: Silicon wafer
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честица

Semiconductors; Silicon wafer

A small,discrete piece of foreign material or silicon not connected crystallography to the wafer.

полупроводник н-типа

Semiconductors; Silicon wafer

Semiconductor in which the concentration of electrons is much higher than the concentration of holes (p>>n); electrons are majority carriers and dominate conductivity.

проводљивост

Semiconductors; Silicon wafer

A measure of the ease with which charge carriers flow in a material; the reciprocal of resistivity.

кристал

Semiconductors; Silicon wafer

Solid featuring periodic spatial arrangement of atoms throughout the entire piece of material.

биполарни

Semiconductors; Silicon wafer

Semiconductor device fabrication technology which produces transistors that use both holes and electrons as charge carriers.

силицијум

Semiconductors; Silicon wafer

The most common semiconductor, atomic number 14, energy gap Eg=1. 12 ev-indirect bandgap; crystal structure- diamond, lattice constant 0. 543 nm, atomic concentration 5x1022 ...